Recent years have seen increasing interest in the development of optical sensors for smartphones, wearables, Internet of Things (IoT) and more. In particular, integrated solutions for spectrometry and multi-spectral imaging have gained much importance in today’s metrology. This trend applies for color and spectral sensors integrated on CMOS imagers (CIS). Yet, many fabrication challenges remain to be solved for the field to meet the industrial requirements regarding reliability, low-cost and high-volume production, while keeping the miniaturization ongoing.
In this regard, the definition of the filter arrays using nanoimprint lithography (NIL) could provide the utmost miniaturization and performance to the sensor. NIL requires the production of a high-quality mold beforehand, to proceed with the subsequent replication and imprint. 

In this proposed master thesis, the student will:

• Develop the design and process flow of the fabrication of the NIL mold
• Develop the lithography and etching process for the definition of the mold
• Characterize the fabricated structures using advanced characterization tools
• Perform data analysis and retrieve statistical variation of the manufactured structures
• Apply the theoretical and experimental knowledge acquired during the internship to elaborate protocol and new concepts for the color and spectral sensors
• Participate to scientific and knowledge dissemination: Scientific report, documentation, presentation, and paper writing